Metadata
Author: patents-wipo
Data
English[en]
An ultraviolet ray based cleaning method and device, the method comprising: step 1, conducting ultraviolet irradiation on a substrate to be cleaned, and controlling the output energy of ultraviolet rays to ensure that photon energy absorbed by TFT component graphics on the substrate to be cleaned is less than the electronic excitation power required by the breakdown of the TFT component graphics; step 2, employing an alkaline solution to clean the substrate to be cleaned; step 3, employing water/vapor double-phase fluid to clean the substrate to be cleaned; step 4, employing deionized water to clean the substrate to be cleaned; step 5, conducting air knife drying on the substrate to be cleaned; step 6, conducting anhydration drying on the substrate to be cleaned to complete cleaning, thus improving approved product yield and cleanliness.
Chinese[zh]
一种基于紫外线的清洗方法及清洗装置,所述方法包括:步骤1、对待清洗基板进行紫外线照射,并控制该紫外线的输出能量,以控制在照射时间内待清洗基板上的TFT元器件图形吸收到的光子能量小于TFT元器件图形击穿所需要的电子激发电量;步骤2、采用碱性溶液对该待清洗基板进行清洗;步骤3、采用水气二流体对该待清洗基板进行清洗;步骤4、采用去离子水对该待清洗基板进行清洗;步骤5、对该待清洗基板进行风刀干燥;步骤6、对该待清洗基板进行去水干燥,完成清洗,提高了产品良率及洗净度。