Metadata
Author: patents-wipo
Data
English[en]
Advantageously, the composition of the present invention is used in relatively short wavelength lithography and has a minimal residual acid content.
French[fr]
Avantageusement, la composition de la présente invention est utilisée en lithographie à longueur d'onde relativement courte et a une teneur d'acide résiduel minimale.
Korean[ko]
유리하게도, 본 발명의 조성물은 보다 짧은 파장 리쏘그래픽 공정에 유용하고 최소 잔류 산 함량을 보유한다.