aluminum nitride oor Spaans
aluminum nitride
en
a nitride of aluminium.
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Nitruro de aluminio
en
chemical compound
es
compuesto químico
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Aluminum nitride (AIN) for use in the manufacture of ceramic electronic components
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The nanocrystalline chromium aluminum nitride (CrAlN) grains were therefore embedded in an amorphous matrix of silicon nitride (SiNx).
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Titanium carbonitride (TiCN) and titanium-aluminum nitride (TiAlN) are effective in cutting stainless steels.
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Aluminum oxide, boron nitride, zinc oxide, and increasingly aluminum nitride are used as fillers for these types of adhesives.
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This research focusses on tribological analysis of Titanium Aluminum Nitride (TiAlN) coatings deposited by means of Triode Magnetron Sputtering, when used as a protective coating on forming tools.
Una presencia positiva, consistentescielo-abstract scielo-abstract
This paper gives the preliminary results about aluminum nitride (AIN) nanoestructured films deposited by pulsed laser deposition (PLD) technique, by using laser Nd:YAG (λ=1064), which hit a target of high purity aluminum (4N) in a nitrogen atmosphere.
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The invention relates to formulations comprising aluminum nitride nanoparticles, at least one dispersant and at least one aqueous solvent. The invention also relates to the method for producing said formulations and to the use thereof for producing a levelling barrier layer.
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Zirconium nitride (ZrN), chromium nitride (CrN) and titanium aluminum nitride (TiAlN) coatings produced by reactive magnetron sputtering technique were evaluated. The tribological properties- coefficient of friction (COF) and wear coefficient were investigated using a ball on disc tribometer and profilometry.
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Niobium Nitride (NbN) and Aluminum Niobium Nitride (Al‐Nb‐N) thin films were deposited on silicon (100) and steel AISI 4140 substrates through a multi-target r.f. (13.56 MHz) magnetron sputtering system.
Solo espero que la música no haya endurecido la yucascielo-abstract scielo-abstract
TiN/TiAlN (titanium nitride/titanium aluminum nitride) multilayer were deposited by d.c. reactive magnetron sputtering using titanium and aluminum targets with 10 cm in diameter and 99.9% purity in an argon/nitrogen (Ar/N) atmosphere, applying a substrate temperature of 300°C and a pressure of 7x10-3 mbar.
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There are several commercially used variants of TiN that have been developed in the past decade, such as titanium carbon nitride (TiCN), titanium aluminium nitride (TiAlN or AlTiN), and titanium aluminum carbon nitride, which may be used individually or in alternating layers with TiN.
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Cutting machines for semiconductor substrates made of sapphire, silicon, silicon carbide, glass, crystal, lithium tantalite, gallium arsenide, indium phosphide, gallium nitride or aluminum gallium arsenide and bonded wafers of these substances
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It is therefore necessary to develop a new processing regime for aluminum nitride.
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Aluminum Nitride Machining
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Aluminum Nitride (AlN)
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Correlation between optical, morphological and compositional properties of aluminum nitride thin films by pulsed laser deposition
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Mutifunctional Aluminum Nitride powder is widely used due to its good properties.
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AIN integrated circuit aluminum nitride ceramic substrate Brand: Hard
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High Quality Cooling AIN Sheet, Aluminum Nitride ALN, High Heat Conductivity AIN Suppliers in China
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The best ones are made from aluminum nitride – ceramics.
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Aluminum Nitride (AlN) - Powder - Material Information
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high quality Aluminum nitride Aluminum nitride powders aln powder
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