An ultraviolet ray based cleaning method and device, the method comprising: step 1, conducting ultraviolet irradiation on a substrate to be cleaned, and controlling the output energy of ultraviolet rays to ensure that photon energy absorbed by TFT component graphics on the substrate to be cleaned is less than the electronic excitation power required by the breakdown of the TFT component graphics; step 2, employing an alkaline solution to clean the substrate to be cleaned; step 3, employing water/vapor double-phase fluid to clean the substrate to be cleaned; step 4, employing deionized water to clean the substrate to be cleaned; step 5, conducting air knife drying on the substrate to be cleaned; step 6, conducting anhydration drying on the substrate to be cleaned to complete cleaning, thus improving approved product yield and cleanliness.
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